A finite element analysis (FEA) of surface lasmon polariton (SPP) assisted evanescent near field optical lithography (ENFOL) is described. A gold on silicon nitride nanostructured, low-stress, conformable mask is used to control the coupling etween surface lasmons (SPs) and the incident light, in conjunction with an optically active resist, to couple the SPs and the transmitted evanescent field for in lithography
