Simulation studies of plasmon enhanced evanescent near-field optical lithography

dc.contributor.author	Sefa-Ntiri, B.
dc.contributor.author	Docker, P.
dc.contributor.author	Ward, M.C.
dc.contributor.author	Prewett, P.D.
dc.date.accessioned	2021-10-11T10:41:50Z
dc.date.available	2021-10-11T10:41:50Z
dc.date.issued	2005
dc.identifier.issn	23105496
dc.identifier.uri	http://hdl.handle.net/123456789/6177
dc.description	4p:, ill.	en_US
dc.description.abstract	A finite element analysis (FEA) of surface lasmon polariton (SPP) assisted evanescent near field optical lithography (ENFOL) is described. A gold on silicon nitride nanostructured, low-stress, conformable mask is used to control the coupling etween surface lasmons (SPs) and the incident light, in conjunction with an optically active resist, to couple the SPs and the transmitted evanescent field for in lithography	en_US
dc.language.iso	en	en_US
dc.publisher	University of Cape Coast	en_US
dc.subject	Surface plasmons hotonics	en_US
dc.subject	Evanescent field	en_US
dc.title	Simulation studies of plasmon enhanced evanescent near-field optical lithography	en_US
dc.type	Article	en_US